Line Scan For High-Precision Wafer Inspection

Maximum Precision. Minimal Defects. Maximum Process Reliability.

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Precision Under High Pressure

Precise detection of even the smallest macro defects such as particles, scratches, or coating defects. Reliable and reproducible even at maximum process speed.

Maximum Speed

Line scan technology scans 300 mm wafers in less than 10 seconds and enables detection accuracy of up to 5 µm – without slowing down production flow.

Stable Throughput & Quality

Automated inspection replaces error-prone manual checks and ensures consistent quality with lower scrap costs.

Requirements For Modern Wafer Inspection

Technical Performance Parameters

A scratch measuring 10 µm becomes visible thanks to homogeneous dark field illumination - even on highly reflective surfaces.

Scan widths

210 mm / 310 mm

Resolution

5–15 µm

Scanning time

< 10 seconds per wafer

Illumination

Bright field / coaxial + dark field combination for maximum contrast

Homogeneity

Very uniform illumination thanks to Corona II reflector technology

The Right Solution For Every Wafer Size

With the combination of allPIXA evo cameras, lenses, Corona II illumination, intelligent adjustment tools, and the optional line scan vision platform, Allied Vision offers a complete solution made up of standard components for wafer inspection – for both 200 mm and 300 mm wafers. Fast, reliable, and optimally integrable into existing and new production lines.

200 mm Wafer Size

13 µm	6,5 µm
Camera: 1x allPIXA evo 16k (color) Illumination: 1x bright field (340 mm), 2x dark field (340 mm) Special feature: Compact single-camera setup, no stitching required.	Camera: 1x allPIXA evo 32k (mono) Illumination: 1x bright field (340 mm), 2x dark field (340 mm) Special feature: Compact single-camera setup, no stitching required.

Optional: With the alignment adapter, alignment ruler, and software integration of an alignment function in GCT, setup is accurate to the millimeter – fast, repeatable, and reliable.

300 mm Wafer Size

9,5 µm

5 µm

Camera: 1x allPIXA evo 32k (mono)
Illumination: 1x bright field (510 mm), 2x dark field (510 mm)
Special feature: Compact single-camera setup, no stitching required.

Camera: 2x allPIXA evo 32k (mono)
Illumination: 1x bright field (510 mm), 2x dark field (510 mm)
Special feature: Maximum precision with dual camera setup.

Optional: With the alignment adapter, alignment ruler, and software integration of an alignment function in GCT, setup is accurate to the millimeter – fast, repeatable, and reliable.

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